Product features:
1. Automatic control interface and touch screen man-machine interface, easy to operate
2. Unique cavity design, good cleaning uniformity, high cleaning quality
3. It uses a two-layer structure, 4-6 material boxes per layer, combined with chemical reactivity and physical impact, short cleaning cycle, high efficiency
4. Plasma cleaning has the characteristics of high repeatability, strong controllability, high utilization rate, no pollution and low operating cost
5. The system has the advantages of simple structure, small footprint, high efficiency, easy operation and maintenance, fast speed and stable operation.
6. Before D/A, it will increase the surface wetting ability of the lead frame or substrate, making it more precise and firm.
Technical parameters:
Serial number | Model number | AS-V100 |
1 | Overall dimensions of equipment | Length × depth × height =1200mm×800mm×1750mm |
2 | Vacuum chamber size | Length × depth × height =450mm×450mm×610mm |
3 | Power frequency | 13.56MHz |
4 | Power supply | 1Kw |
5 | Electrode plate specifications | Non-standard customization |
6 | Software control | PLC touch screen |
7 | Gas purity requirement | Industrial grade gas or better |
8 | Loadable gas | O₂,N₂,Ar |