Plasma cleaning machine

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Radio-frequency plasma equipment

Radio-frequency plasma equipment

  • Category:RF Plasma
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  • Release time:2023-12-12 14:39:37
  • Product description

Product features:

1. Automatic control interface and touch screen man-machine interface, easy to operate

2. Unique cavity design, good cleaning uniformity, high cleaning quality

3. It uses a two-layer structure, 4-6 material boxes per layer, combined with chemical reactivity and physical impact, short cleaning cycle, high efficiency

4. Plasma cleaning has the characteristics of high repeatability, strong controllability, high utilization rate, no pollution and low operating cost

5. The system has the advantages of simple structure, small footprint, high efficiency, easy operation and maintenance, fast speed and stable operation.

6. Before D/A, it will increase the surface wetting ability of the lead frame or substrate, making it more precise and firm.


射频等离子设备


Technical parameters:

Serial number

Model number

AS-V100

1

Overall dimensions of equipment

Length × depth × height = 1200mm×800mm×1750mm

2

Vacuum chamber size

Length × depth × height =450mm×450mm×610mm

3

Power frequency

13.56MHz

4

Power supply

1Kw

5

Electrode plate specifications

Non-standard customization

6

Software control

PLC touch screen

7

Gas purity requirement

Industrial grade gas or better

8

Loadable gas

O,N,Ar


Previous:Radio-Frequency Plasma2023-12-12

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