I. Core Structure and Operating Principle

The core structure comprises dual independent vacuum chambers, a plasma generation system, an in-line transport mechanism, and an intelligent control system. During operation, the equipment first evacuates the chamber to 10⁻³ Pa. Gases such as argon and oxygen are then introduced and excited into plasma via radiofrequency technology. The physical bombardment of the plasma removes surface contaminants and oxide layers from the workpiece, while its chemical action constructs active functional groups, thereby enhancing material adhesion.

II. Advantages of Dual-Chamber Design

Compared to single-chamber equipment, the dual-chamber configuration enables simultaneous execution of ‘vacuum extraction’ and ‘plasma treatment’. This eliminates waiting time for vacuum extraction, reducing idle time by 50% and boosting production efficiency by over 40%. Furthermore, each chamber allows independent setting of process parameters, supporting simultaneous processing of different workpieces and accommodating diverse production requirements.

III. Application Fields and Technical Features

Widely employed in scenarios such as pre-treatment for electronic component soldering, surface disinfection of medical devices, and modification of new energy battery electrode sheets. Technologically, plasma density uniformity error is ≤5%, ensuring consistent treatment outcomes; the in-line transfer system supports automated loading and unloading, minimising manual intervention; the intelligent control system enables real-time parameter monitoring, stores 100 process recipes, and offers user-friendly operation.