Product features:
(1) Automatic control interface and touch screen man-machine interface, easy to operate and real-time process monitoring at any time.
(2) Unique cavity design, good cleaning uniformity, high cleaning quality.
(3) Plasma cleaning has the characteristics of high repeatability, strong controllability, high utilization rate, no pollution and low operating cost.
(4) Different combinations of cavity structures are suitable for different types of products, components or vehicles.
(5) A wide range of applications, such as semiconductor packaging industry, semiconductor power devices, etc
Technical parameters:
Serial number | Model number | AS-V100 |
1 | Overall dimensions of equipment | Length × depth × height =1200mm×800mm×1750mm |
2 | Vacuum chamber size | Length × depth × height =450mm×450mm×610mm |
3 | Power frequency | 2.45GHz |
4 | Power supply | 600w |
5 | Electrode plate specifications | Non-standard customization |
6 | Software control | PLC touch screen |
7 | Gas purity requirement | Industrial grade gas or better |
8 | Loadable gas | O₂ / N₂/ Ar |