Vacuum plasma cleaning machine system by the response chamber (vacuum chamber), high frequency plasma power supply and vacuum pump group (vacuum system), inflation system and automatic control system (touch computer +PLC multi-step process automatic control, full circuit detection) and other parts, plasma is a matter of existence. Also called the fourth state (usually material in solid, liquid, gas three states exist), such as the Earth's atmosphere in the ionosphere. Vacuum plasma cleaning system is the use of high voltage power supply under a certain pressure conditions to apply the gas to meet the energy, and then produce plasma, plasma condition there are the following substances: in the state of high-speed movement of electrons; Neutral atoms, molecules, and groups of atoms (free radicals) in an active state; Ionized atoms or molecules; The molecules, atoms, etc., do not react, but the substance still maintains a neutral state in general. The plasma moves at high speed under the effect of electromagnetic field, impacts the surface of the object, and has the intention of cleaning, etching, activating and modifying.

Plasma cleaning machine selection of high degree of automation CNC technology, the selection of high-precision control equipment to ensure the accurate control of time, while cleaning in vacuum, will not produce damage layer on the surface, to ensure that the cleaning surface is not secondary pollution, appearance quality is ensured

Plasma cleaning systems have three common frequencies in the world

40KHz, 13.56MHz and 2.45GHz, different frequencies have different processing effects on the workpiece, as follows:

The plasma with a frequency of 40kHz is an ultrasonic plasma, and the response generated is a physical response, which is used in a large cavity, characterized by high plasma energy, but small plasma density, no need to match, and low cost. The norm is 5 kW to 20 kW.

The plasma with an excited frequency of 13.56MHz is a radio-frequency plasma, which produces both physical and chemical reactions. The most commonly used power supply is characterized by low plasma energy, but high plasma density. The effect is even, and the cost is slightly higher. The custom is 100 watts to 1000 watts.

The plasma with the excitation frequency of 2.45GHz is microwave plasma, and the reaction generated by it is too expensive for chemical reaction, and it is currently used less

First, plasma cleaning machine effect

1, activation bond energy - crosslinking effect

The particle energy in the plasma is 0~20eV, and most of the bond energy in the polymer is 0~10eV, so after the plasma effect to the surface of the workpiece, the original chemical bond on the surface of the workpiece can be cracked, and the free radicals in the plasma and these bonds form a network crosslinking structure, which greatly activates the surface activity.

2. Shelling on the surface of the data - physical effects

Mainly use a lot of ions in the plasma, excited state molecules, free radicals and other active particles for pure physical impact, the atoms on the surface of the workpiece or atoms attached to the surface of the workpiece knocked off, not only remove the original pollutants and impurities on the surface of the workpiece, but also produce etching effect, the surface of the workpiece becomes rough, forming many fine pits. The specific surface volume of the workpiece surface is increased, and the moisture function of the solid surface is improved. Because the uniform free radical of the ion at low pressure is lighter and longer, the accumulation of energy is obtained, so in the physical impact, the higher the energy of the ion, the more energy to impact, so if the physical effect is mainly, it must control the lower pressure down the reaction, in order to ensure the lower pressure, the need to continue to pass air or other gases, so the cleaning effect is better

3, to form new functional groups - chemical effects

The reaction mechanism is mainly the use of free radicals in the plasma to do chemical reaction with the surface of the data. When the frequency and pressure are higher, the production of free radicals is more favorable, so if the chemical reaction is mainly used, it must be equipped with a higher frequency and higher pressure to carry out the reaction.

Commonly used gases in the chemical reaction are hydrogen (H2), oxygen (O2), methane (CF4), etc., these gases react into highly active free radicals in the plasma cleaning machine, the introduction of reactive gases, then the surface of the activated data will produce complex chemical reactions, the introduction of new functional groups, such as hydrocarbon groups, amino groups, carboxyl groups, etc., these functional groups are active groups. The surface activity of data can be improved significantly.

In particular, there are some workpiece processing needs both physical effects and chemical effects, and the frequency should be 13.56MHz series at this time.

Two, the four uses of plasma cleaning machine

1. Cleaning

The surface of the process component is cleaned by the physical bombardment of the plasma beam, and its surface can also react chemically with a specific gas to convert the cleaned pollutant into a gas phase and be discharged.

A Use: remove grease, oil, oxide, fiber; Removal of silicone resin; Pretreatment before binding, welding and bonding; Pretreatment of metal parts before coating.

B Applicable components: Almost all data can be accurately cleaned using plasma, typical electronic components; Rubber-metal connectors; Switch; Sensor; Medical implants; Small parts; O-ring seal; Spiral; Laser parts.

2. Appearance activation and modification

The workpiece can pass oxygen or air into the plasma chamber to activate its surface, and the data surface will form oxygen atoms to enhance the bonding force and binding force of the surface.

A Use: Pre-treatment before bonding; Pretreatment before coating; Pretreatment before printing.

B Applicable components: Almost all data can be activated by plasma, typically with sensors; Semiconductor data; A catheter; Car headlight reflectors; Rubber; Aluminum coating; Graphite film; PDMS, etc.

3. Etching

The surface of the workpiece is excited by plasma etching, after plasma sputtering, shelling, the surface data is stripped, transformed into a gas phase and discharged, the surface volume of the data is increased and wet, the etching effect is used in printing, bonding, pre-treatment before painting and rough the data.

A Use: silicon etching; PTFE etching; Improve the adhesion of high temperature resistant plastics to coatings and binders, such as: PTFE,FPA,FEP; Remove the photoresist.

B Applicable parts: plastic; Semiconductor; Glass; Remove component packaging; Medical devices; The circuit board.

4. Coating

The workpiece is introduced into a plasma echo chamber, which atomizes the gas and precipitates it on the surface of the workpiece.

A Use: accumulation of hydrophobic layer; Accumulation of hydrophilic layer; Maintenance or insulation buildup; Nonproliferation layer.

B Applicable parts: all industrial data; Typical are metals; Glass; ceramic