AV-P30 High-Volume Plasma System
Plasma treatment is an effective surface processing solution for various materials such as resins, ceramics, metals, composite materials, etc. Such treatment is often used for contaminant removal, desmear & etch-back, carbon removal as well as PTFE surface activation, thereby material properties are enhanced and surface energy is increased for better adhesion and durability, which play important roles in supporting a wide range of industries, including PCB & HDI manufacturing, semiconductor packaging, medical device processing, and automotive decoration cleaning.
The AV-P30 plasma system is designed based on years of hand-in-hand experience with PCB manufacturing plants as well as users from other industries. By means of outstanding treatment uniformity and environment-friendly process, the model is a mature solution to the process requirements of above-mentioned application fields.
Main Applications & Benefits:
1. Desmear & etch-back and contaminant removal after laser drilling of vias.
2. Removal of carbides generated by laser blind hole drilling.
3. Removal of dry film residues during fine line making.
4. Surface activation for PTFE materials before PTH process.
5. Surface activation before inner layer laminating.
6. Surface activation before immersion gold.
7. Surface modification of morphology and wettability to increase the bonding force between layers.
Features & Performance:
1. Excellent plasma treatment uniformity with advanced upper air intake & lower air extraction system and power-power electrode design.
2. Intelligent system: Real-time display of each workpiece status, safety protection functions such as air shortage, pressure protection, circuit protection, etc.
3. Optimized cooling channels guide cooling water to run in regulated direction to ensure temperature uniformity & long service cycle.
4. High cooling performance by means of two separate water channels to vacuum chamber and dry pump.
5. Large capacity & high efficiency at low average cost.
Product Specifications:
Ln | Item | Description |
1 | Outline Dimensions - footprint | 2,380W × 2,150D × 2,200H mm |
2 | Vacuum Chamber Dimensions | 1,445W × 1265D × 1055H mm |
3 | Maximum Treatment Area | 1,120D × 635H mm |
4 | Maximum Treatment Cells | 15 |
5 | Rating Voltage | 3-Phase 380 VAC, 50 Hz |
6 | Output Frequency | 40 kHz |
7 | Output Power | 10 kW |
8 | Discharge Vacuum Degree | 20~80 Pa |
9 | Loadable Gas | O2, N2, H2, CF4 |
10 | Treatment Time for Each Batch | 15~30 mins |